Small Multi-Spin Processor: Etching, Cleaning, Developing
During scanning, uniformity improvement through peripheral speed control is also possible! We have received numerous uses and have a wealth of experience compared to conventional methods.
This is an introduction to a device that performs a series of patterning processes, including developing, etching, rinsing, and drying, using a conventional spin method. Depending on the substrate type, it allows for the selection of spray or paddle recipes during the developing and etching processes, and it can also improve uniformity through speed control during scanning. This machine is low-cost and has a wealth of experience with numerous users, but the process for recycling requires a two-chamber setup. If proper separation of waste liquid, drainage, and exhaust is necessary, we will respond with a new type of UDS device. *For more details, please refer to the PDF materials or feel free to contact us.*
- 企業：ソフエンジニアリング
- 価格：Other
